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Strain relaxation and critical temperature in epitaxial ferroelectric Pb(Zr0.20Ti0.80)O3 thin films
| Content Provider | Semantic Scholar |
|---|---|
| Author | Gariglio, Stefano Stucki, Nicolas Triscone, Jean-Marc Triscone, Gilles |
| Copyright Year | 2007 |
| Abstract | Strain relaxation and the ferroelectric critical temperature were investigated in a series of epitaxial Pb(Zr0.20Ti0.80)O3 thin films of different thicknesses grown on metallic 0.5% Nb-doped SrTiO3 substrates. Detailed x-ray diffraction studies reveal that strain relaxation progressively occurs via misfit dislocations as the film thickness is increased from fully coherent films (for films below 150A) to essentially relaxed films (for thicknesses above typically 800A). It is found that this change in the strain state does not modify the ferroelectric critical temperature which is found for all the samples to be around 680°C, a value much higher than the bulk. |
| Starting Page | 202905 |
| Ending Page | 202905 |
| Page Count | 1 |
| File Format | PDF HTM / HTML |
| DOI | 10.1063/1.2740171 |
| Volume Number | 90 |
| Alternate Webpage(s) | https://archive-ouverte.unige.ch/files/downloads/0/0/1/1/4/2/7/1/unige_114271_attachment01.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |