Loading...
Please wait, while we are loading the content...
Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography.
| Content Provider | Semantic Scholar |
|---|---|
| Author | Attwood, David Sommargren, Gary E. Beguiristain, Raul Nguyen, K. Bokor, Jeffrey Ceglio, Natale M. Jackson, Koblar A. Koike, Masato Underwood, J. |
| Copyright Year | 1993 |
| Abstract | Techniques are described for at-wavelength interferometry of multilayer coated optics designed for use in extreme-ultraviolet lithography. Broadly tunable undulator radiation, which covers the spectral region from 45 to 400 A, is described. The coherent power available at these wavelengths is described, and several types of interferometer that might be suitable at these short wavelengths are also described. |
| File Format | PDF HTM / HTML |
| DOI | 10.1364/AO.32.007022 |
| PubMed reference number | 20856562 |
| Journal | Medline |
| Volume Number | 32 |
| Issue Number | 34 |
| Alternate Webpage(s) | http://divine.eecs.berkeley.edu/~jbokor/Full_text_pubs/93-78.pdf |
| Journal | Applied optics |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
