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TCAD Process/Device Modeling Challenges and Opportunities for the Next Decade
| Content Provider | Semantic Scholar |
|---|---|
| Author | Giles, Martin D. |
| Copyright Year | 2004 |
| Abstract | Technology CAD process and device simulation tools play a critical role in advanced technology development by giving insight into the relationships between processing choices and nanoscale device performance that cannot be obtained from physical metrology tools alone. TCAD makes its greatest impact when a detailed understanding of the underlying physical mechanisms is tightly coupled within the technology development cycle so that physical insights feed directly into technology direction. Since the pace of introduction for new materials, impurities, and device structures continues to increase, the criticality of such physically-based analyses is greater than ever. This paper highlights progress in front-end process and device modeling over the past decade that has enabled TCAD’s successes, and the challenges and opportunities that lie ahead. |
| Starting Page | 177 |
| Ending Page | 182 |
| Page Count | 6 |
| File Format | PDF HTM / HTML |
| DOI | 10.1007/s10825-004-7040-2 |
| Alternate Webpage(s) | http://www.iwce.org/fileadmin/IWCE_cache/iwce2004/www.iwce.nanohub.org/talks/tcad/S02-01-Giles.pdf |
| Alternate Webpage(s) | https://page-one.springer.com/pdf/preview/10.1007/s10825-004-7040-2 |
| Alternate Webpage(s) | http://in4.iue.tuwien.ac.at/pdfs/iwce/iwce10_2004/2-1.pdf |
| Alternate Webpage(s) | https://doi.org/10.1007/s10825-004-7040-2 |
| Volume Number | 3 |
| Journal | 2004 Abstracts 10th International Workshop on Computational Electronics |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
