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Pulsed laser deposition of NiMnGa thin films on silicon
| Content Provider | Semantic Scholar |
|---|---|
| Author | Hakola, Antti Heczko, Oleg Jaakkola, Antti Kajava, T. T. Ullakko, K. M. |
| Copyright Year | 2004 |
| Abstract | Thin films of the magnetic shape-memory (MSM) material NiMnGa have been deposited on Si(100) substrates using pulsed laser deposition. The -–200 300nm-thick films were prepared at substrate temperatures ranging from 450 °C to 650 °C and at different background Ar pressures. Large saturation magnetizations, up to 60% of the bulk value, were measured for the films. Only the films deposited in vacuum or at Ar pressures below 10-3 mbar and at temperatures between 500 °C and 600 °C were ferromagnetic. The films are mainly crystallized in the austenitic phase and they have a smooth surface with a low droplet density (0.01 μm-2). The magnetization and surface quality are sufficient that the films could be utilized in the realization of thin-film MSM devices. |
| Starting Page | 1505 |
| Ending Page | 1508 |
| Page Count | 4 |
| File Format | PDF HTM / HTML |
| DOI | 10.1007/s00339-004-2831-7 |
| Alternate Webpage(s) | https://aaltodoc.aalto.fi/bitstream/handle/123456789/2728/article1.pdf?isAllowed=y&sequence=2 |
| Alternate Webpage(s) | https://doi.org/10.1007/s00339-004-2831-7 |
| Volume Number | 79 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
