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Track-etched nanopores in spin-coated polycarbonate films applied as sputtering mask
| Content Provider | Semantic Scholar |
|---|---|
| Author | Gehrke, H.-G. Krauser, Jürgen Trautmann, Christina Weidinger, Alois Hofsaess, Hans C. |
| Copyright Year | 2009 |
| Abstract | Thin polycarbonate films were spin-coated on silicon substrates and subsequently irradiated with 1-GeV U ions. The ion tracks in the polymer layer were chemically etched yielding nanopores of about 40 nm diameter. In a second process, the nanoporous polymer film acted as mask for structuring the Si substrate underneath. Sputtering with 5-keV Xe ions produced surface craters of depth ∼150 nm and diameter ∼80 nm. This arrangement can be used for the fabrication of track-based nanostructures with self-aligned apertures. |
| Starting Page | 1032 |
| Ending Page | 1034 |
| Page Count | 3 |
| File Format | PDF HTM / HTML |
| DOI | 10.1016/j.nimb.2009.02.029 |
| Volume Number | 267 |
| Alternate Webpage(s) | https://hal.archives-ouvertes.fr/hal-00249369/document |
| Alternate Webpage(s) | http://hal.archives-ouvertes.fr/docs/00/28/37/37/PDF/PB22-revised-Manuscript_Nix.pdf |
| Alternate Webpage(s) | https://doi.org/10.1016/j.nimb.2009.02.029 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
