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GaN metal-oxide-semiconductor field-effect transistors on AlGaN/GaN heterostructure with recessed gate
| Content Provider | Semantic Scholar |
|---|---|
| Author | Wang, Qingpeng Ao, Jin-Ping Wang, Pangpang Jiang, Ying Li, Liuan Kawaharada, Kazuya Liu, Yang |
| Copyright Year | 2015 |
| Abstract | GaN metal-oxide-semiconductor field-effect transistors (MOSFETs) on AlGaN/GaN heterostructure with a recess gate were fabricated and characterized. The device showed good pinch-off characteristics and a maximum field-effect mobility of 145.2 cm2·V−1·s−1. The effects of etching gas of Cl2 and SiCl4 were investigated in the gate recess process. SiCl4-etched devices showed higher channel mobility and lower threshold voltage. Atomic force microscope measurement was done to investigate the etching profile with different etching protection mask. Compared with photoresist, SiO2-masked sample showed lower surface roughness and better profile with stepper sidewall and weaker trenching effect resulting in higher channel mobility in the MOSFET. |
| Starting Page | 151 |
| Ending Page | 155 |
| Page Count | 5 |
| File Format | PDF HTM / HTML |
| DOI | 10.1007/s11706-015-0286-8 |
| Volume Number | 9 |
| Alternate Webpage(s) | https://page-one.springer.com/pdf/preview/10.1007/s11706-015-0286-8 |
| Alternate Webpage(s) | https://doi.org/10.1007/s11706-015-0286-8 |
| Journal | Frontiers of Materials Science |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |