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Effect of deposition conditions on mechanical stresses and microstructure of sputter-deposited molybdenum and reactively sputter-deposited molybdenum nitride films
| Content Provider | Semantic Scholar |
|---|---|
| Author | Shen, Yaogen |
| Copyright Year | 2003 |
| Abstract | Abstract A combined investigation of mechanical stress generation by in situ substrate curvature measurements during the growth of MoN x thin films, with 0≤x≤0.35, and of structural properties by ex situ X-ray diffraction (XRD), transmission electron microscopy (TEM), transmission electron diffraction (TED), X-ray photoelectron spectroscopy (XPS), and electron energy-loss spectroscopy (EELS) is reported. It was found that the Mo film stresses strongly depended on the Ar sputtering pressure and changed from highly compressive to highly tensile in a relatively narrow pressure range of 6–12 mTorr. For pressures exceeding ∼40 mTorr, the stress in the film was nearly zero. Cross-sectional TEM measurements indicated that the compressively stressed films contained a dense microstructure without any columns, while the films having tensile stress had a very columnar microstructure. High sputtering-gas pressure conditions yielded dendritic-like film growth, resulting in complete relaxation of the mechanical tensile stresses. It was also found that the properties of the deposited MoN x films depended not only on the nitrogen partial pressure in Ar–N 2 gas mixtures but also on the total sputtering-gas pressure. Cross-sectional TEM studies showed that an average column width for 160 nm-thick films near stoichiometry of Mo 2 N was about ∼15–20 nm. Using the electron scattering data collected from a range of crystalline samples for calculating the pair distribution function (PDF) by Fourier transformation in real space, MoN and MoMo bonding in the films was also identified. Once the Mo 2 N phase was formed, the density, microstructure and bonding feature were similar and insensitive to the total sputtering pressure used in this study. |
| Starting Page | 158 |
| Ending Page | 167 |
| Page Count | 10 |
| File Format | PDF HTM / HTML |
| DOI | 10.1016/S0921-5093(03)00336-8 |
| Volume Number | 359 |
| Alternate Webpage(s) | http://venus.ifca.unican.es/~xray/XEUS/archivopapers/ShenMSE359_158.pdf |
| Alternate Webpage(s) | https://doi.org/10.1016/S0921-5093%2803%2900336-8 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |