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Scope of Vhf Plasma Deposition for Thin-film Silicon Solar Cells
| Content Provider | Semantic Scholar |
|---|---|
| Author | Keppner, Herbert Kroll, Ulrich Torres, Pedro Meier, Johannes K.-H. Fischer, Diego Go, Ma. Stephanie C. Tschamer, R. Shah, Arvind D. Microtechnique, Lnstitut De Breguet, Rue A. L. |
| Copyright Year | 2001 |
| Abstract | The world-wide attempts in obtaining thin-film crystalline silicon are reviewed. Based on literature published sofar, it appears that high-temperature manufacturing steps seem to be unavoidable for obtaining high conversion efficiencies of crystalline silicon based solar cells. High process temperatures are in contradiction for the use of low-cost substrates like e.g. glass or aluminium. Such substrates, however, are essential for obtaining low module manufacturing costs. The Very High Frequency Glow Discharge Process (VHF-GD) could have the potential to overcome the temperature efficiency contradiction. |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | https://infoscience.epfl.ch/record/133753/files/paper_224.pdf |
| Language | English |
| Access Restriction | Open |
| Subject Keyword | 3D film Aluminum Efficiency Glow Physical vapor deposition Plasma-enhanced chemical vapor deposition Scientific Publication Silicon Solar cell |
| Content Type | Text |
| Resource Type | Article |