NDLI: Comparison of phenol photodegradation by UV/H2O2 and photo-Fenton processes.

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Comparison of phenol photodegradation by UV/H2O2 and photo-Fenton processes.

Content Provider	Semantic Scholar
Author	Assadi, Ali Eslami, Akbar
Copyright Year	2010
Abstract	In this study, advanced photochemical oxidation processes, UV/H2O2 and photo-Fenton systems were investigated for phenol degradation in wastewater with low-pressure mercury vapor lamp. The results indicated that in the UV/H2O2 system, a sufficient amount of H2O2 was necessary, but a very high H2O2 concentration inhibited the photolysis rate. The optimum H2O2 concentration was achieved in the range of 0.05-0.1 mol/L at phenol concentration of 100 mg/L. No pH effects were observed in the range of 4-10. The results of study showed that the UV/H2O2/Fe(II) system was the most effective treatment process under acidic condition and generated a higher rate of phenol degradation at a very short time. It enhanced the oxidation rate by 3 times the rate for the UV/H2O2 process. For all these reactions, the degradation rates are evaluated by determining their first-order rate constants and half-life times. At the optimum condition, phenol completely disappeared with UV/H2O2 and UV/H2O2/Fe(II) systems in less than 50 min and 20 min, respectively.
Starting Page	807
Ending Page	812
Page Count	6
File Format	PDF HTM / HTML
DOI	10.30638/eemj.2010.107
Volume Number	9
Alternate Webpage(s)	http://www.eemj.icpm.tuiasi.ro/pdfs/vol9/no6/10_169_Assadi.pdf
Alternate Webpage(s)	https://doi.org/10.30638/eemj.2010.107
Language	English
Access Restriction	Open
Content Type	Text
Resource Type	Article

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