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Stress mechanism of pulsed laser-driven damage in thin film under nanosecond ultraviolet laser irradiation
| Content Provider | Semantic Scholar |
|---|---|
| Author | Yu, Zhenkun He, Hongbo Qi, Hongji Liu, Wenwen |
| Copyright Year | 2013 |
| Abstract | An analytical model is derived to describe the stress mechanism in a thin film against the laser-induced damage threshold (LIDT) based on the thermal transfer equation. Different structures of high-reflection films at 355 nm are prepared to validate this model. LIDTs are found to have a linear relationship with stress. Furthermore, predictions from the simple model agree with the experiments. |
| Starting Page | 73101 |
| Ending Page | 73102 |
| Page Count | 2 |
| File Format | PDF HTM / HTML |
| DOI | 10.3788/col201311.073101 |
| Volume Number | 11 |
| Alternate Webpage(s) | http://www.col.opticsx.org/viewFull.aspx?id=COL201311073101-02 |
| Alternate Webpage(s) | https://doi.org/10.3788/col201311.073101 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |