NDLI: Experimental Investigation on Vertically Oriented Graphene Grown in a Plasma-Enhanced Chemical Vapor Deposition Process.

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Experimental Investigation on Vertically Oriented Graphene Grown in a Plasma-Enhanced Chemical Vapor Deposition Process.

Content Provider	Semantic Scholar
Author	Ma, Yifei Jiang, Wei Han, Jiemin Tong, Zhaomin Wang, Mei Suhr, Jonghwan Chen, Xuyuan Xiao, Liantuan Jia, Suotang Chae, Heeyeop
Copyright Year	2019
Abstract	Vertically oriented graphene (VG) with three-dimensional architecture has been proved to exhibit unique properties, and its particular morphology has been realized by researchers to be crucial for its performance in practical applications. In this study, we investigated the morphology evolution of VG films synthesized by the plasma-enhanced chemical vapor deposition process, including porous graphene film, graphene wall, and graphene forest. This study reveals that the morphology of VG is controlled by a combination of the deposition and etching effects and tailored by the growth conditions, such as plasma source power and growth time and temperature. The plasma source power relates to the number of branches of VG, and the growth temperature relates to the thickness of each VG flake, whereas the growth time determines the height of VG. Finally, the electrochemical properties of VG films along with morphology evolution are investigated by fabricating as VG-based supercapacitor electrodes.
Starting Page	10237
Ending Page	10243
Page Count	7
File Format	PDF HTM / HTML
DOI	10.1021/acsami.9b00896
Alternate Webpage(s)	http://laserspec.sxu.edu.cn/docs/2019-03/3bc95edcfd404f1597d391c7dd7f8aee.pdf
PubMed reference number	30794749
Alternate Webpage(s)	https://doi.org/10.1021/acsami.9b00896
Journal	Medline
Volume Number	11
Issue Number	10
Journal	ACS applied materials & interfaces
Language	English
Access Restriction	Open
Content Type	Text
Resource Type	Article

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