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Optical nanolithography with λ/15 resolution using bowtie aperture array
| Content Provider | Semantic Scholar |
|---|---|
| Author | Wen, Xiaolei Traverso, Luis M. Srisungsitthisunti, Pornsak Xu, Xianfan Moon, Euclid Eberle |
| Copyright Year | 2014 |
| Abstract | We report optical parallel nanolithography using bowtie apertures with the help of the interferometric-spatial-phase-imaging (ISPI) technique. The ISPI system can detect and control the distance between the bowtie aperture, and photoresist with a resolution of sub-nanometer level. It overcomes the difficulties brought by the light divergence of bowtie apertures. Parallel nanolithography with feature size of 22 ± 5 nm is achieved. This technique combines high resolution, parallel throughput, and low cost, which is promising for practical applications. |
| Starting Page | 307 |
| Ending Page | 311 |
| Page Count | 5 |
| File Format | PDF HTM / HTML |
| DOI | 10.1007/s00339-014-8265-y |
| Volume Number | 117 |
| Alternate Webpage(s) | https://engineering.purdue.edu/NanoLab/PDF/2014%20Optical%20nanolithography%20with%2015-fold%20resolution%20using%20bowtie%20aperture%20array.pdf |
| Alternate Webpage(s) | http://dspace.mit.edu/openaccess-disseminate/1721.1/104444 |
| Alternate Webpage(s) | https://dspace.mit.edu/openaccess-disseminate/1721.1/104444 |
| Alternate Webpage(s) | https://doi.org/10.1007/s00339-014-8265-y |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
