NDLI: Effects of substrate temperature on structure and mechanical properties of sputter deposited fluorocarbon thin films

Content Provider	Semantic Scholar
Author	Suzuki, Yuta Fu, Haojie Abe, Yoshio Kawamura, Midori
Copyright Year	2013
Abstract	Abstract Fluorocarbon thin films were formed by radio-frequency magnetron sputtering using a polytetrafluoroethylene target with different substrate temperatures in the range −5 to 200 °C. Using X-ray diffraction and Fourier transform infrared spectroscopy, it was confirmed that the films were amorphous and contained C–F bonds. X-ray photoelectron spectroscopy measurements indicated that the amount of cross-linking in the films increased with increasing substrate temperature. Corresponding to the change in the molecular structure, the adhesion strength of the films to the Si substrate, estimated by micro-scratch testing, improved with increasing substrate temperature.
Starting Page	218
Ending Page	221
Page Count	4
File Format	PDF HTM / HTML
DOI	10.1016/j.vacuum.2012.05.029
Volume Number	87
Alternate Webpage(s)	https://core.ac.uk/download/pdf/148706077.pdf
Alternate Webpage(s)	https://doi.org/10.1016/j.vacuum.2012.05.029
Language	English
Access Restriction	Open
Content Type	Text
Resource Type	Article

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