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Atomic layer deposition of nickel-cobalt spinel thin films.
| Content Provider | Semantic Scholar |
|---|---|
| Author | Hagen, Dirk J. Tripathi, Tripurari Sharan Karppinen, Mikko |
| Copyright Year | 2017 |
| Abstract | We report the atomic layer deposition (ALD) of high-quality crystalline thin films of the spinel-oxide system (Co1-xNix)3O4. These spinel oxides are ferrimagnetic p-type semiconductors, and promising material candidates for several applications ranging from photovoltaics and spintronics to thermoelectrics. The spinel phase is obtained for Ni contents exceeding the x = 0.33 limit for bulk samples. It is observed that the electrical resistivity decreases continuously with x while the magnetic moment increases up to x = 0.5. This is in contrast to bulk samples where a decrease of resistivity is not observed for x > 0.33 due to the formation of a rock-salt phase. From UV-VIS-NIR absorption measurements, a change from distinct absorption edges for the parent oxide Co3O4 to a continuous absorption band ranging deep into the near infrared for 0 < x ≤ 0.5 was observed. The conformal deposition of dense films on high-aspect-ratio patterns is demonstrated. |
| Starting Page | 4796 |
| Ending Page | 4805 |
| Page Count | 10 |
| File Format | PDF HTM / HTML |
| DOI | 10.1039/c7dt00512a |
| PubMed reference number | 28345704 |
| Journal | Medline |
| Volume Number | 46 |
| Issue Number | 14 |
| Alternate Webpage(s) | https://research.aalto.fi/files/11440981/ERC_32_accepted.pdf |
| Alternate Webpage(s) | https://doi.org/10.1039/c7dt00512a |
| Journal | Dalton transactions |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
