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Impacts of gate recess and passivation on AlGaN/GaN high electron mobility transistors
| Content Provider | Semantic Scholar |
|---|---|
| Author | Chan, Chih-Yuan Lee, Ting-Chi Hsu, Shawn S. H. Chen, Leaf Lin, Yu-Syuan |
| Copyright Year | 2007 |
| Abstract | In this study, the impacts of gate recess and passivation on AlGaN/GaN high electron mobility transistors (HEMTs) were investigated. The trap-related characteristics were studied in detail by several different measurements including dc current– voltage, current collapse, gate lag, and flicker noise characterizations. With a Cl2/Ar-recessed gate, drain current collapse factors (� Imax )o f� 37:5 and � 6:9% were observed before and after SiN passivation. The gate lag measurements showed that the lagging phenomena almost disappear with SiN passivation for both Cl2- and Cl2/Ar-recessed devices. However, the flicker noise measurements revealed distinct noise levels of devices with different processes even after passivation. As the gate voltage (VG) changed from 2 to � 4 V, the devices recessed by Cl2 exhibited lower drain noise current densities (SID=ID 2 ranging from 2:8 � 10 � 14 to 1:7 � 10 � 12 Hz � 1 at 1 kHz) than those etched by Cl2/Ar mixture gas (SID=ID 2 ranging from 6:3 � 10 � 14 to 6:0 � 10 � 12 Hz � 1 at 1 kHz), whereas the devices without the recess process showed the lowest noise levels (SID=ID 2 ranging from 2:8 � 10 � 15 to 1:3 � 10 � 13 Hz � 1 at 1 kHz). It was found that SID=ID 2 increased monotonically when VG |
| Starting Page | 478 |
| Ending Page | 484 |
| Page Count | 7 |
| File Format | PDF HTM / HTML |
| DOI | 10.1143/JJAP.46.478 |
| Volume Number | 46 |
| Alternate Webpage(s) | http://www.ee.nthu.edu.tw/shhsu/journal%20papers/Gate%20recess%20GaN%20Hemt_JJAP.pdf |
| Alternate Webpage(s) | https://doi.org/10.1143/JJAP.46.478 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |