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Magnetron sputtering of epitaxial ZrB2 thin films on 4H‐SiC(0001) and Si(111)
| Content Provider | Semantic Scholar |
|---|---|
| Author | Tengdelius, Lina Birch, Jens Hultman, Lars Forsberg, Urban Janz'en, Erik Högberg, Hans |
| Copyright Year | 2014 |
| Abstract | Epitaxial ZrB2 thin films were deposited at a temperature of 900 °C on 4H-SiC(0001) and Si(111) substrates by magnetron sputtering from a ZrB2 source at high rate ~80 nm/min. The films were analyze . |
| Starting Page | 636 |
| Ending Page | 640 |
| Page Count | 5 |
| File Format | PDF HTM / HTML |
| DOI | 10.1002/pssa.201330308 |
| Volume Number | 211 |
| Alternate Webpage(s) | http://liu.diva-portal.org/smash/get/diva2:658962/FULLTEXT01.pdf |
| Alternate Webpage(s) | https://doi.org/10.1002/pssa.201330308 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |