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Wet Etching Characteristics of both As-deposited and Annealed Al2O3 and HfAlOx Films
| Content Provider | Semantic Scholar |
|---|---|
| Author | Nishimura, Tomoaki Kuse, Ronald Tominaga, Koji Nabatame, Toshihide Toriumi, Akira |
| Copyright Year | 2003 |
| Abstract | MIRAI Project, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), AIST Tsukuba West SCR, 16-1 Onogawa, Tsukuba 305-8569, Japan Phone: +81-298-49-1648 E-mail: t-nishimura@mirai.aist.go.jp MIRAI Project, Association of Super-Advanced Electronics Technology (ASET), AIST, Tsukuba 305-8569, Japan 3 Department of Materials Science, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Tokyo 113-8586, Japan |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | https://confit.atlas.jp/guide/event-img/ssdm2003/P4-13/public/pdf_archive?type=in |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |