NDLI: Compact Modeling of Threshold Voltage in Double-Gate MOSFET including quantum mechanical and short channel effects

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Compact Modeling of Threshold Voltage in Double-Gate MOSFET including quantum mechanical and short channel effects

Content Provider	Semantic Scholar
Author	Néhari, K. Munteanu, Daniela Harrison, Soren Tintori, Olivier Skotnicki, Thomas Monnet, Julien C.
Copyright Year	2005
Abstract	A compact model for the threshold voltage in DoubleGate MOSFET is developed. The model takes into account short-channel effects, carrier quantization and temperature dependence of the threshold voltage. We assume a parabolic variation of the potential with the vertical position in the silicon film at threshold. An analytical expression for the surface potential dependence as a function of bias and position in the silicon film is also developed and used for the inversion charge calculation. The model is fully validated by 2D quantum numerical simulation and is used to predict the threshold voltage roll-off in Double-Gate MOSFET with very short channel lengths and thin films. The comparison with measured threshold voltage shows that the model reproduces with an excellent accuracy the experimental data. The model can be directly implemented in a circuit simulator code and used for the simulation of elementary Double-Gate MOSFET based-circuits.
File Format	PDF HTM / HTML
Alternate Webpage(s)	http://www.nsti.org/publications/Nanotech/2005/pdf/623.pdf
Alternate Webpage(s)	http://www.nsti.org/Nanotech2005/WCM2005/WCM2005-KNehari2.pdf
Alternate Webpage(s)	https://www.researchgate.net/profile/Jean-Luc_Autran/publication/228439095_Compact_Modeling_of_Threshold_Voltage_in_Double-Gate_MOSFET_including_quantum_mechanical_and_short_channel_effects/links/02e7e527255a2653ce000000.pdf
Language	English
Access Restriction	Open
Content Type	Text
Resource Type	Article

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