Tomographic measurement of buried interface roughness

Content Provider	Semantic Scholar
Author	Hayashida, Misa Ogawa, Shinichi Malac, Marek
Copyright Year	2015
Abstract	Interface roughness of buried layers in nano-meter size devices often degrades performance of the devices because the roughness of the interfaces might affect expected growth of consequent layers during the device fabrication. To characterize the roughness of an exposed surface, atomic force microscope (AFM) has been widely used. On the other hand, when the interfaces are buried by additional device layers, it is impossible to measure the interface roughness by AFM. In this study, we present quantitative measurement of buried interface roughness by electron tomography using a STEM. The presented method allows to characterize interface roughness of the devices with a resolution of 1 nm.
File Format	PDF HTM / HTML
Alternate Webpage(s)	http://diyhpl.us/~nmz787/M&M%202015/7337/2243.pdf
Language	English
Access Restriction	Open
Subject Keyword	Atomic-force microscopy Electron tomography GNU nano Image resolution Interface Device Component Microscope Device Component Scanning Probe Microscopes (device) anatomical layer
Content Type	Text
Resource Type	Article