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NANO-PATTERN LITHOGRAPHIC FABRICATION USING PULLED MICRO PIPETTE AND METHOD THEREOF BACKGROUND OF THE INVENTION 1. Field of the Invention
| Content Provider | Semantic Scholar |
|---|---|
| Copyright Year | 2017 |
| Abstract | (73) Assignee: Won Ho Jhe, Seoul (KR) (74) Attorney, Agent, or Firm-Chien-Wei (Chris) Chou; Oppenheimer Wolff & Donnelly LLP (*) Notice: Subject to any disclaimer, the term of this patent is extended or adjusted under 35 (57) ABSTRACT U.S.C. 154(b) by 0 days. A nano-pattern lithographic fabrication apparatus for fabri (21) Appl. No.: 09/443,051 cating a fine pattern using a pulled micro-pipette is dis closed. This apparatus includes a container for receiving a (22) Filed: Nov. 18, 1999 certain Solution therein, a container controlling unit for (51) Int. Cl." ................................................... H01J 3/14 controlling the movement of the container and an ejection of (52) U.S. Cl. ................ ... 250/234; 250/576 the Solution filled in the container, a Sample moving unit for (58) Field of Search ................................. 250/234, 202, Supporting and moving the Sample, a detector for detecting 250/559.29-559.32,559.13, 576, 573, 574, a distance between the container controlling unit and the 221; 356/615, 621, 246, 440, 427, 428, Sample moving unit, and a controlling unit for receiving a 436; 222/1; 427/91 detection signal from the detector and controlling the move (56) References Cited ment of the container and the Sample moving unit and a distance therebetween. U.S. PATENT DOCUMENTS |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | https://patentimages.storage.googleapis.com/79/fa/17/96073ff8e9f1ec/US6476381.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |