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Forming Micro Patterns of Semconductor Device Using the Same
| Content Provider | Semantic Scholar |
|---|---|
| Author | Huff, Mark J. |
| Copyright Year | 2017 |
| Abstract | A photomask including chromium patterns divided into two groups in Such a fashion that the chromium patterns in one of the two chromium pattern groups alternate, one by one, with the chromium patterns in the other chromium pattern group, the chromium patterns being formed on two quartz Substrate for the two chromium pattern groups, respectively, to prepare for the photomask, two separate photomasks each having an increased Space defined between adjacent chro mium patterns thereof So as to avoid a Severe diffraction of light passing between the adjacent chromium patterns. A method for forming micro patterns of a Semiconductor device using the photomask is also disclosed. |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | https://patentimages.storage.googleapis.com/49/9f/1c/485d53948242a1/US6569605.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Patent |
