NDLI: Fluorinated organic-inorganic hybrid mold as a new stamp for nanoimprint and soft lithography.

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Fluorinated organic-inorganic hybrid mold as a new stamp for nanoimprint and soft lithography.

Content Provider	Semantic Scholar
Author	Choi, Dae-Geun Jeong, Jun-Ho Sim, Young-Suk Lee, Eung-Sug Kim, Woo-Soo Bae, Byeong-Soo
Copyright Year	2005
Abstract	In this paper, we fabricated a fluorinated organic-inorganic hybrid mold using a nonhydrolytic sol-gel process which can produce a crack-free mold without leaving any trace of solvent. No special chemical treatment of a release layer is needed because the fluorinated hybrid mold has fluorine molecules in the backbone. The other advantages of the hybrid mold are thermal stability over 300 degrees C. The hybrid mold produced from UV nanoimprint lithography (UV-NIL) was used as a mold for the next UV-NIL and soft lithography without requiring use of an antisticking layer. Various nanometer scale patterns including sub-100 nm patterns could be obtained from the hybrid mold. Nanopatterning processes using this low-cost mold are useful because they preserve the expensive original master.
Starting Page	1700913
Ending Page	1700913
Page Count	1
File Format	PDF HTM / HTML
Alternate Webpage(s)	http://koasas.kaist.ac.kr/bitstream/10203/9323/1/93.pdf
PubMed reference number	16207009v1
Volume Number	21
Issue Number	21
Journal	Langmuir : the ACS journal of surfaces and colloids
Language	English
Access Restriction	Open
Subject Keyword	Departure - action Ethanol 0.62 ML/ML Topical Gel Filamentous fungus Fluorine Nanoimprinting Sol-Gel Phase Transition Vertebral column
Content Type	Text
Resource Type	Article

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