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Characterization of tungsten tips for STM by SEM / AES / XPS
| Content Provider | Semantic Scholar |
|---|---|
| Author | Lisowski, Wojciech Berg, Albert H. J. Van Den Kip, G. A. M. Hanekamp, L. J. |
| Copyright Year | 2004 |
| Abstract | For the first time, both X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES) techniques were applied in analysis of surface contamination of electrochemically etched Scanning Tunneling Microscope (STM) tungsten tips. Carbon monoxide, graphite, tungsten carbide and tungsten oxide were found as main surface contaminations of STM tungsten tips. The thickness of tungsten oxide layers was estimated to be about 1 3 nm. Quantitative analysis of surface and bulk concentration of carbon, oxygen and tungsten has been performed. |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | http://doc.utwente.nl/103995/1/art_10.1007_BF00321548.pdf |
| Language | English |
| Access Restriction | Open |
| Subject Keyword | Carbon Monoxide Electron Microscope Device Component Natural graphite Oxygen Photoelectric effect Radionuclide Imaging Scanning Auger Spectrometer (device) Scanning Tunneling Microscopes (device) Software transactional memory Thickness (graph theory) Tungsten:MCnc:Pt:RBC:Qn Tunneling protocol Ultraviolet Photoelectron Spectroscopy X-Ray Photoelectron Spectroscopy anatomical layer tungsten oxide |
| Content Type | Text |
| Resource Type | Article |