Electron beam deposition of gold nanostructures in a reactive environment

Content Provider	Semantic Scholar
Author	Folch, Albert Tejada, Javier Peters, Christopher J. Wrighton, Mark S.
Copyright Year	1996
Abstract	Electron beam deposition ~EBD! is a maskless technique suitable for the fabrication of nanometer scale structures. Metals can be deposited from an organometallic gas, but simultaneous carbon deposition typically yields grossly impure ~;25% metal! deposits. We have found that the metal content of the deposited solid is dramatically improved by performing the whole EBD process in a reactive gaseous environment containing a source of oxygen ~O2 or H2O! in addition to the organometallic gas. With simple procedures we prepared Au deposits showing significantly diminished C content ~up to 50% metal! as the partial pressure of O2 ~or H2O! is increased in the gas.© 1995 American Institute of Physics.
File Format	PDF HTM / HTML
Alternate Webpage(s)	http://faculty.washington.edu/afolch/Folch_1995_ApplPhysLett.pdf
Language	English
Access Restriction	Open
Subject Keyword	Chemical vapor deposition Cone-Beam Computed Tomography Electron Probe Microanalysis Electron beam tomography Gold Nanostructured Materials Oxygen Partial Pressure Water
Content Type	Text
Resource Type	Article