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Sputtered deposited nanocrystalline ZnO films: A correlation between electrical, optical and microstructural properties
| Content Provider | Semantic Scholar |
|---|---|
| Author | Lee, Jaseun Hodgson, Michael Metson, James B. Gong, Hao Pal, Umapada |
| Copyright Year | 2005 |
| Abstract | Zinc oxide thin films were prepared by dc (direct current) and rf (radio frequency) magnetron sputtering on glass substrates. ZnO films produced by dc sputtering have a high resistance, while the films produced using rf sputtering are significantly more conductive. While the conductive films have a compact nodular surface morphology, the resistive films have a relatively porous surface with columnar structures in cross section. Compared to the dc sputtered films, rf sputtered films have a microstructure with smaller d spacing, lower internal stress, higher band gap energy and higher density. Dependence of conductivity on the deposition technique and the resulting d spacing , stress, density, band gap, film thickness and Al doping are discussed. Correlations between the electrical conductivity, microstructural parameters and optical properties of the films have been made. |
| Starting Page | 1641 |
| Ending Page | 1646 |
| Page Count | 6 |
| File Format | PDF HTM / HTML |
| DOI | 10.1007/s00339-004-3197-6 |
| Volume Number | 80 |
| Alternate Webpage(s) | http://www.ifuap.buap.mx/~upal/assets/84.pdf |
| Alternate Webpage(s) | https://doi.org/10.1007/s00339-004-3197-6 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
