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Jective for Microlithography Comprising Such a Mirror or Such a Substrate, and Projection Exposure Apparatus for Microlithography Comprising Such a Projection Objective
| Content Provider | Semantic Scholar |
|---|---|
| Copyright Year | 2011 |
| Abstract | (51) International Patent Classification: Aalen (DE). CLAUSS, Wilfried [DE/DE]; LustnauerG02B 5/08 (2006.0 1) G03F 7/20 (2006.0 1) strasse 39, 72074 Tuebingen (DE). PAUL, Hans-Jochen [DE/DE]; Spenglerstrasse 23, 7343 1 Aalen (DE). (21) International Application Number: BRAUN, Gerhard [DE/DE]; Bogenweg 13, 86739 EderPCT/EP20 10/067003 heim (DE). MIGURA, Sascha [DE/DE]; Steinertgasse (22) International Filing Date: 56, 73434 Aalen-Unterrombach (DE). DODOC, Aure8 November 2010 (08.1 1.2010) lian [RO/DE]; Ellwanger Strasse 21, 89522 Heidenheim (DE). ZACZEK, Christoph [DE/DE]; Im Sonnenfeld 19, (25) Filing Language: English 73540 Heubach (DE). BLANCKENHAGEN, Gisela von (26) Publication Language: English [DE/DE]; Schlossstr. 6/2, 73433 Aalen (DE). LOERCHER, Roland [DE/DE]; Rebhuhnweg 1, 73434 (30) Priority Data: Aalen-Hofherrnweiler (DE). 1 |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | https://patentimages.storage.googleapis.com/21/86/31/caa04941c7a9ea/WO2011072953A1.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Patent |