NDLI: Formation of Anodic Oxide Films on Tantalum in Presence of Ultraviolet Radiations &Heat Treatment of Anodic Tantalum Oxide Films

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Formation of Anodic Oxide Films on Tantalum in Presence of Ultraviolet Radiations &Heat Treatment of Anodic Tantalum Oxide Films

Content Provider	Semantic Scholar
Author	Nigam, R. K. Kalra, K. C. Katyal, Parveen
Copyright Year	1988
Abstract	The data obtained during the growth of anodic oxide films on tantalum indicate higher values of rates of growth, constant A (of Guntherschulze-8etz equation) and Tafel slopes in the presence of UV radiations than those in the absence of radiations. However, the values of constant B (of Guntherscbultze-Betz equation), haIfjump distances and breakdown voltages are lower in the presence of UV light. Faster rate in the presence of UV is probably due to increased number of mobile ions per unit volume and decreased width of potential energy barrier. Stimulated ionic movements due to UV radiations cause breakdown of films at lower voltages. Heat treatment of the oxide films in air makes these more conducting. This effect depends on the time period and temperature of heat treatment but is independent of film thickness and nature of electrolyte. The conductivity patterns before and after heating show similar trends and are of two types: One is associated with high conductance and lower rate of change of capacitance with increase in temperature and the other is associated with low conductances and changes cllpacitance more rapidly with increase in temperature. The hypothetical break temperature is independent of the nature of electrolyte or treatment.
File Format	PDF HTM / HTML
Alternate Webpage(s)	http://nopr.niscair.res.in/bitstream/123456789/47663/1/IJCA%2027A(7)%20569-573.pdf
Language	English
Access Restriction	Open
Content Type	Text
Resource Type	Article

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