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A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method - European Patent Office - EP 2221669 A2
| Content Provider | Semantic Scholar |
|---|---|
| Copyright Year | 2010 |
| Abstract | (72) Inventors: • Stavenga, Marco 5615 CR, Eindhoven (NL) • Kemper, Nicolaas 5653 RL, Eindhoven (NL) • Leenders, Martinus 3161 JG, Rhoon (NL) • Liebregts, Paulus 5504 HB, Veldhoven (NL) • Mulkens, Johannes 5552 MA, Valkenswaard (NL) • Eummelen, Erik 5614 BG, Eindhoven (NL) • Moerman, Richard 5691 RB, Son (NL) • Riepen, Michel 5501 CA, Veldhoven (NL) • Shulepov, Sergei 5658 EB, Eindhoven (NL) • Brands, Gert-Jan 5581 AD, Waalre (NL) • Steffens, Koen 5505 RT, Veldhoven (NL) • Cronwijk, Jan 5684 AB, Best (NL) • Meijers, Ralph 6462 HV, Kerkrade (NL) • Evangelista, Place 5654 JH, Eindhoven (NL) • Bessems, David 5616 CE, Eindhoven (NL) • Li, Hua 5627 WC Eindhoven (NL) • Jochemsen, Marinus 5508 TM, Veldhoven (NL) • Gunther, Pieter 6001 GS, Weert (NL) • Bell, Franciscus 5685 HT, Best (NL) • Witberg, Erik 4826 HD, Breda (NL) • Smits, Marcus 3930, Hamont-Achel (BE) • Ma, Zhenhua 5629 KJ, Eindhoven (NL) |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | https://patentimages.storage.googleapis.com/64/65/1f/59b3c1dced3669/EP2221669A3.pdf |
| Alternate Webpage(s) | https://patentimages.storage.googleapis.com/6e/d0/43/42222bc72aaad0/EP2221669A2.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
