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Molecular beam mass spectrometry investigations of low temperature diamond growth using CO2/CH4 plasmas
| Content Provider | Semantic Scholar |
|---|---|
| Author | Petherbridge, James R. May, Paul W. Pearce, S. Rosser, Kn Ashfold, Michael N. R. |
| Copyright Year | 2001 |
| Abstract | Diamond films have been successfully deposited at substrate temperatures as low as 435C using CO CH gas mixtures in a 24 Ž. microwave plasma chemical vapour deposition CVD reactor. In order to understand why it is possible to grow diamond at these low temperatures using these gases, we have performed the first in situ molecular beam mass spectrometry studies to measure, simultaneously, the concentrations of the dominant gas phase species present during growth over a wide range of plasma gas Ž. mixtures 080% CH , balance CO . Optical emission spectroscopy has also been used to investigate gas phase species present 42 in the microwave plasma. These experimental measurements give further evidence that CH radicals may be the key growth 3 species and suggest that CO may be of greater importance to the plasma chemistry of CO CH gas mixtures than previously 24 thought. 2001 Elsevier Science B.V. All rights reserved. |
| Starting Page | 393 |
| Ending Page | 398 |
| Page Count | 6 |
| File Format | PDF HTM / HTML |
| DOI | 10.1016/S0925-9635(00)00593-8 |
| Volume Number | 10 |
| Alternate Webpage(s) | http://www.chm.bristol.ac.uk/pt/diamond/pdf/drm10-393.pdf |
| Alternate Webpage(s) | https://doi.org/10.1016/S0925-9635%2800%2900593-8 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
