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Recent progress in high resolution lithography
| Content Provider | Semantic Scholar |
|---|---|
| Author | Bratton, Daniel Yang, D. W. Dai, Junyan Ober, Christopher K. |
| Copyright Year | 2006 |
| Abstract | The nanotechnology revolution of the past decade owes much to the science of lithography, an umbrella term which encompasses everything from conventional photolithography to “unconventional” soft lithography and the self-assembly of block polymers. In this review, some of the recent advances in lithography are summarized with special reference to the microelectronics industry. The next generation photolithography, two-photon lithography, step-and-flash imprint lithography and nanofabrication using block copolymers are covered, in an attempt to describe more recent work in this vibrant and active field of research. Copyright © 2006 John Wiley & Sons, Ltd. |
| Starting Page | 94 |
| Ending Page | 103 |
| Page Count | 10 |
| File Format | PDF HTM / HTML |
| DOI | 10.1002/pat.662 |
| Volume Number | 17 |
| Alternate Webpage(s) | http://ece560web.groups.et.byu.net/papers/lithography_bratton_06.pdf |
| Alternate Webpage(s) | https://doi.org/10.1002/pat.662 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |