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Titanium oxide thin films deposited by high-power impulse magnetron sputtering
| Content Provider | Semantic Scholar |
|---|---|
| Author | Konstantinidis, Stéphanos Dauchot, Jean Pierre Hecq, Michel |
| Copyright Year | 2006 |
| Abstract | AbstractIonized physical vapor deposition processes are of great interest for surface modification because the flexibility of the thin film depositionprocess can be increased by ionizing the metallic vapor. Recently, high-power impulse magnetron discharges have been implemented to achievehigh ionization rates.Thin films of titanium oxide have been deposited on glass and steel substrates using 450×150 mm rectangular titanium target in argon–oxygenatmosphere. The average power delivered to the plasma is ranging between 1.5 and 2 kWand peak current and voltage are respectively 200 A and900 V.Films are characterized using Scanning Electron Microscopy, Grazing Incidence X-ray Diffraction and Optical Transmission Spectroscopy.One of the major findings is the presence of rutile deposited on steel substrate (even for 0 V bias grounded substrate) and the significant increaseof the refractive index of the films deposited on glass compared to thin films deposited via conventional direct current bipolar pulsed magnetronsputtering. Films synthesized by high-power impulse magnetron sputtering are denser.© 2006 Elsevier B.V. All rights reserved. |
| Starting Page | 1182 |
| Ending Page | 1186 |
| Page Count | 5 |
| File Format | PDF HTM / HTML |
| DOI | 10.1016/j.tsf.2006.07.089 |
| Volume Number | 515 |
| Alternate Webpage(s) | https://docnum.umons.ac.be/Access/WebOpenAccess/GetDocument.aspx?Filename=Konstantinidis-2006-3-Journal.pdf&GuidTicket=2dc11060-5a71-486d-b7af-6a277f33f8dd |
| Alternate Webpage(s) | https://doi.org/10.1016/j.tsf.2006.07.089 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
