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Metal Grating Patterning on Fiber Facets by UV-Based Nano Imprint and Transfer Lithography Using Optical Alignment
| Content Provider | Semantic Scholar |
|---|---|
| Author | Scheerlinck, Stijn Dubruel, Peter Bienstman, Peter Schacht, Etienne Honoré Thourhout, Dries Van Baets, Roel |
| Copyright Year | 2009 |
| Abstract | UV-based nano imprint and transfer lithography (NITL) is proposed as a flexible, low cost and versatile approach for defining sub-micron metal patterns on optical fiber facets in a single-processing step. NITL relies on a specially prepared mold carrying the pattern that is to be transferred to the facet. The fiber's light-guiding properties allow control of the position of the metal structures by optical alignment. |
| Starting Page | 1415 |
| Ending Page | 1420 |
| Page Count | 6 |
| File Format | PDF HTM / HTML |
| DOI | 10.1109/JLT.2008.2004955 |
| Volume Number | 27 |
| Alternate Webpage(s) | http://photonics.intec.ugent.be/download/pub_2508.pdf |
| Alternate Webpage(s) | https://doi.org/10.1109/JLT.2008.2004955 |
| Journal | Journal of Lightwave Technology |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
