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Photosensitive Resin Composition and Uses Thereof Background of the Invention
| Content Provider | Semantic Scholar |
|---|---|
| Copyright Year | 2017 |
| Abstract | (54) PHOTOSENSITIVE RESIN COMPOSITION Publication Classification AND USES THEREOF (51) Int. Cl. (71) Applicant: CHI MEI CORPORATION, Tainan GO3F 7/075 (2006.01) City (TW) GO2F I/I67 (2006.01) (52) U.S. Cl. (72) Inventor: CHING-YUAN TSENG, TAINAN CPC .............. G03F 7/0757 (2013.01); G02F I/I67 CITY (TW) (2013.01); G02F 2001/1678 (2013.01) USPC ...... 359/296.430/280.1; 430/285.1; 252/586 (73) Assignee: CHI MEI CORPORATION, Tainan City (TW) (57) ABSTRACT |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | https://patentimages.storage.googleapis.com/b8/e2/4f/f664df277a9950/US20140293400A1.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Patent |