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Reactive Gas Ion Beam Generation Using Single Atom W(111) Gas Field Ion Sources
| Content Provider | Semantic Scholar |
|---|---|
| Author | Urban, Radovan Moritani, Hironori Wolkow, Robert A. Pitters, Jason |
| Copyright Year | 2016 |
| Abstract | The scanning ion microscopy is gaining momentum as it provides several key advantages over scanning electron microscopy: (i) enhanced depth of focus, (ii) improved surface and element sensitivity, (iii) better lateral resolution, and (iv) nanomachining and milling. It uses different ions to achieve these tasks ranging from inert gases like helium and neon for imaging and ion milling. Other gases such as argon, nitrogen, and oxygen have potential for further sputtering and etching. It is therefore crucial that gas field ion sources provide necessary robustness and stability for range of various gases. |
| Starting Page | 616 |
| Ending Page | 617 |
| Page Count | 2 |
| File Format | PDF HTM / HTML |
| DOI | 10.1017/S1431927616003937 |
| Volume Number | 22 |
| Alternate Webpage(s) | http://journals.cambridge.org/fulltext_content/supplementary/MAM22_S3_minisite/7337/0616.pdf |
| Alternate Webpage(s) | https://doi.org/10.1017/S1431927616003937 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
