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A Simulation-Based Framework for Industrial Automated Wet-Etch Station Scheduling Problem In The Semiconductor Industry
| Content Provider | Semantic Scholar |
|---|---|
| Author | Aguirre, Adrián M. Cafaro, Vanina G. Méndez, Carlos A. Castro, Pedro M. |
| Copyright Year | 2011 |
| Abstract | This work presents the development and application of an advanced modelling, simulation and optimizationbased framework to the efficient operation of the Automated Wet-etch Station (AWS), a critical stage in Semiconductor Manufacturing Systems (SMS). Lying on the main concepts of the processinteraction approach, principal components and tools available in the Arena simulation software were used to achieve the best representation of this complex and highly-constrained manufacturing system. Furthermore, advanced Arena templates were utilized for modelling very specific operation features arising in the process under study. The major aim of this work is to provide a novel computer-aided tool to systematically improve the dynamic operation of this critical manufacturing station by quickly generating efficient schedules for the shared processing and transportation devices. |
| Starting Page | 384 |
| Ending Page | 393 |
| Page Count | 10 |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | http://www.msc-les.org/proceedings/emss/2011/EMSS2011_384.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
