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Negative-ion implanter for powders and its application to nanometer-sized metal particle formation in the surface of glass beads
| Content Provider | Semantic Scholar |
|---|---|
| Author | Tsuji, Hiroshi Kido, Shunsuke Sasaki, Hitoshi Gotoh, Yasuhito Ishikawa, Junzo |
| Copyright Year | 2000 |
| Abstract | We have developed a negative-ion implanter for uniform implantation into each powder surface without particle scattering. It consists of a plasma sputter-type negative-ion source, a mass separator, an acceleration tube, a lens, X–Y deflectors, a 90° deflector, and a Faraday cup with an agitator. The electrostatic 90° deflector bends a horizontal beam to a vertical direction and leads it into the Faraday cup. The agitator is an electromagnetic vibrator at a frequency of 120 Hz, which mixes particles for whole surface treatment and uniform implantation. In this implanter, we obtained no scattering implantation for spherical oxide beads with diameters ranging from 5 to 1000 μm in an agitated state, and also obtained a good uniformity of implanted atoms among beads. For an application of the negative ion implantation into powders, copper ions were implanted into soda-lime glass beads and plates at conditions of 50 and 30 keV, respectively, with 1×1017 ions/cm2. In linear optical properties, both implanted sam... |
| Starting Page | 804 |
| Ending Page | 806 |
| Page Count | 3 |
| File Format | PDF HTM / HTML |
| DOI | 10.1063/1.1150299 |
| Volume Number | 71 |
| Alternate Webpage(s) | https://repository.kulib.kyoto-u.ac.jp/dspace/bitstream/2433/39800/1/RevSciInstrum_71_804.pdf |
| Alternate Webpage(s) | https://doi.org/10.1063/1.1150299 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
