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Metal-insulator transition in a doped semiconductor
| Content Provider | Semantic Scholar |
|---|---|
| Author | Rosenbaum, Thomas F. Milligan, Rebecca Paalanen, Mikko Thomas, Gordon A. Bhatt, Rutul |
| Copyright Year | 2011 |
| Abstract | Millikelvin measurements of the conductivity as a function of donor density and uniaxial stress in bulk samples of phosphorus-doped silicon establish that the transition from metal to insulator is continuous, but sharper than predicted by scaling theories of localization. The divergence of the dielectric susceptibility as the transition is approached from below also points out problems in current scaling theories. The temperature dependence of the conductivity and the magnetoresistance in the metal indicate the importance of Coulomb interactions in describing the behavior of disordered systems. |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | http://authors.library.caltech.edu/47048/1/PhysRevB.27.7509.pdf |
| Language | English |
| Access Restriction | Open |
| Subject Keyword | Doping (semiconductor) Image scaling Interaction Metal (API) Phosphorus Semiconductor Silicon Test scaling Topological insulator |
| Content Type | Text |
| Resource Type | Article |
