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Antenna configuration for uniform large-area inductively coupled plasma production
| Content Provider | Semantic Scholar |
|---|---|
| Author | Chang, C. S. Chang, Heon Yong Kim, Sang S. |
| Copyright Year | 2000 |
| Abstract | An antenna configuration for uniform plasma generation in a large-area inductively coupled plasma (ICP) source is presented and investigated using numerical analysis. The numerical results show that a properly tuned, segmented coil system with an external variable capacitor can allow antenna voltage, currents, and plasma uniformity to be controlled in the large-area ICP source. The key element of this concept is to induce LC-resonance in the coil system by the external capacitance variation. Through the LC-resonance, not only a small antenna voltage can be obtained, but also a selected coil current near a low plasma density regime can be significantly enhanced. Self-consistent fluid simulations for Ar and Cl2 plasmas indicate that the radial plasma spread can be optimized near the LC-resonance condition. |
| Starting Page | 492 |
| Ending Page | 494 |
| Page Count | 3 |
| File Format | PDF HTM / HTML |
| DOI | 10.1063/1.127021 |
| Volume Number | 83 |
| Alternate Webpage(s) | http://koasas.kaist.ac.kr/bitstream/10203/76046/1/000088225400011.pdf |
| Alternate Webpage(s) | https://doi.org/10.1063/1.127021 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
