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Submonolayer films on a Si(111) surface under low-energy ion bombardment
| Content Provider | Semantic Scholar |
|---|---|
| Author | Nimatov, S. J. Rumi, Danko |
| Copyright Year | 2014 |
| Abstract | The kinetics of deposition for monomolecular submonolayer films on a Si(111) surface is studied via low-energy electron diffraction with measurements of the intensities of diffraction reflection and the elastic background. The degree of structural perfection in growing films is estimated for alkali-metal silicides and silicon from low-energy beams. The optimum energy and dose intervals of silicide film formation are determined. |
| Starting Page | 531 |
| Ending Page | 534 |
| Page Count | 4 |
| File Format | PDF HTM / HTML |
| DOI | 10.3103/S1062873814060215 |
| Volume Number | 78 |
| Alternate Webpage(s) | https://page-one.springer.com/pdf/preview/10.3103/S1062873814060215 |
| Alternate Webpage(s) | https://doi.org/10.3103/S1062873814060215 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |