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Absorbance Modulation Optical Lithography
| Content Provider | Semantic Scholar |
|---|---|
| Author | Tsai, Hsin-Yu Sidney |
| Copyright Year | 2007 |
| Abstract | In this thesis, the concept of absorbance-modulation optical lithography (AMOL) is described, and the feasibility experimentally verified. AMOL is an implementation of nodal lithography, which is not bounded by the diffraction limit of incident lights. Experimental results showed promising capability of AMOL and matched well with simulation. Several key elements of the AMOL system are discussed: the material systems of AMOL, limitations on the material and optical systems presented, and the design and fabrication of spiral phase elements that generate ring-shaped beams required by AMOL. Thesis Supervisor: Henry I. Smith Title: Professor |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | http://dspace.mit.edu/bitstream/handle/1721.1/42253/231635606-MIT.pdf?sequence=2 |
| Alternate Webpage(s) | http://dspace.mit.edu/bitstream/handle/1721.1/42253/231635606-MIT.pdf;jsessionid=B18A7F54DB0BA532692D05FA0D0AD374?sequence=2 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |