Effects of bias voltage on the corrosion resistance of titanium nitride thin films fabricated by dynamic plasma immersion ion implantation-deposition

Content Provider	Semantic Scholar
Author	Tian, Xiubo Fu, Ricky K. Y. Chu, Paul K.
Copyright Year	2002
Abstract	Dynamic plasma-based thin-film deposition incorporating ion mixing and plasma immersion is an effective technique to synthesize nitride-based hard films. We have fabricated TiN films using a filtered titanium vacuum arc in a nitrogen plasma environment. A pulsed high voltage is applied to the target for a short time when the metallic arc is fired to attain simultaneous plasma deposition and ion mixing. We investigate the dependence of the corrosion resistance and interfacial structure of the treated samples on the applied voltage. Our Auger results reveal an oxygen-rich surface film due to the non-ultra-high-vacuum conditions and high affinity of oxygen to titanium. The corrosion current is reduced by two orders of magnitude comparing the sample processed at 8 kV to the untreated sample, but the 23 kV sample unexpectedly shows worse results. The pitting potential diminishes substantially although the corrosion current is similar to that observed in the 8 kV sample. The polarization test data are consisten...
Starting Page	160
Ending Page	164
Page Count	5
File Format	PDF HTM / HTML
DOI	10.1116/1.1427892
Volume Number	20
Alternate Webpage(s)	http://www6.cityu.edu.hk/appkchu/Publications/2002/02.02.pdf
Alternate Webpage(s)	https://doi.org/10.1116/1.1427892
Language	English
Access Restriction	Open
Content Type	Text
Resource Type	Article