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Fabrication and characterization of bit-patterned media beyond 1.5 Tbit/in2.
| Content Provider | Semantic Scholar |
|---|---|
| Author | Yang, Joel K. W. Chen, Yunjie Huang, Tianli Duan, Huigao Thiyagarajah, Naganivetha Leong, Siang Huei Ng, Vivian |
| Copyright Year | 2011 |
| Abstract | We fabricated bit-patterned media (BPM) at densities as high as 3.3 Tbit/in(2) using a process consisting of high-resolution electron-beam lithography followed directly by magnetic film deposition. By avoiding pattern transfer processes such as etching and liftoff that inherently reduce pattern fidelity, the resolution of the final pattern was kept close to that of the lithographic step. Magnetic force microscopy (MFM) showed magnetic isolation of the patterned bits at 1.9 Tbit/in(2), which was close to the resolution limit of the MFM. The method presented will enable studies on magnetic bits packed at ultra-high densities, and can be combined with other scalable patterning methods such as templated self-assembly and nanoimprint lithography for high-volume manufacturing. |
| Starting Page | 385301 |
| Ending Page | 385301 |
| Page Count | 1 |
| File Format | PDF HTM / HTML |
| DOI | 10.1088/0957-4484/22/38/385301 |
| PubMed reference number | 21865632 |
| Journal | Medline |
| Volume Number | 22 |
| Issue Number | 38 |
| Alternate Webpage(s) | http://doc.sciencenet.cn/upload/file/20111018231143290.pdf |
| Alternate Webpage(s) | https://doi.org/10.1088/0957-4484%2F22%2F38%2F385301 |
| Journal | Nanotechnology |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
