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Mo0.5Si0.5/Si multilayer soft x‐ray mirrors, high thermal stability, and normal incidence reflectivity
| Content Provider | Semantic Scholar |
|---|---|
| Author | Stock, H. J. Kleineberg, Ulf Kloidt, Andreas Schmiedeskamp, Bernt Heinzmann, U. Krumrey, Michael Müller, Peter Maria Scholze, Frank |
| Copyright Year | 1993 |
| Abstract | Multilayer soft x‐ray mirrors with an absorber consisting of the mixture Mo0.5Si0.5 have been fabricated by electron‐beam evaporation in UHV. This has been done to get soft x‐ray normal incidence mirrors for 80–100 eV photon energy with enhanced thermal stability and still high reflectivity. The thermal stability is studied by baking them at temperatures between 600 and 950 °C. The results were compared with multilayers of pure Mo and Si, which were also fabricated by electron‐beam evaporation. After each baking step the x‐ray mirrors are characterized by small angle CuKα x‐ray diffraction. The reflectivity of the first‐order Bragg peak is nearly constant up to 20 min baking at 900 °C. Further we present the normal incidence soft x‐ray reflectivity for wavelengths between 12 and 18 nm of a Mo0.5Si0.5/Si mirror with 12 double layers (N=12) and of a Mo0.5Si0.5/Si mirror as deposited with 33 double layers (N=33). With the latter a reflectivity of 46% is achieved. |
| Starting Page | 2207 |
| Ending Page | 2209 |
| Page Count | 3 |
| File Format | PDF HTM / HTML |
| DOI | 10.1063/1.110529 |
| Volume Number | 63 |
| Alternate Webpage(s) | https://pub.uni-bielefeld.de/download/1780417/2312907 |
| Alternate Webpage(s) | https://doi.org/10.1063/1.110529 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
