Advances in top-down and bottom-up surface nanofabrication: techniques, applications & future prospects.

Content Provider	Semantic Scholar
Author	Biswas, Abhijit Bayer, Ilker S. Biris, Alexandru S. Wang, Tao Dervishi, Enkeleda Faupel, Franz
Copyright Year	2012
Abstract	This review highlights the most significant advances of the nanofabrication techniques reported over the past decade with a particular focus on the approaches tailored towards the fabrication of functional nano-devices. The review is divided into two sections: top-down and bottom-up nanofabrication. Under the classification of top-down, special attention is given to technical reports that demonstrate multi-directional patterning capabilities less than or equal to 100 nm. These include recent advances in lithographic techniques, such as optical, electron beam, soft, nanoimprint, scanning probe, and block copolymer lithography. Bottom-up nanofabrication techniques--such as, atomic layer deposition, sol-gel nanofabrication, molecular self-assembly, vapor-phase deposition and DNA-scaffolding for nanoelectronics--are also discussed. Specifically, we describe advances in the fabrication of functional nanocomposites and graphene using chemical and physical vapor deposition. Our aim is to provide a comprehensive platform for prominent nanofabrication tools and techniques in order to facilitate the development of new or hybrid nanofabrication techniques leading to novel and efficient functional nanostructured devices.
Starting Page	2
Ending Page	27
Page Count	26
File Format	PDF HTM / HTML
DOI	10.1016/j.cis.2011.11.001
PubMed reference number	22154364
Journal	Medline
Volume Number	170
Issue Number	1-2
Alternate Webpage(s)	https://nice.asu.edu/printpdf/501
Alternate Webpage(s)	https://doi.org/10.1016/j.cis.2011.11.001
Journal	Advances in colloid and interface science
Language	English
Access Restriction	Open
Content Type	Text
Resource Type	Article