Atomic force microscope tip spontaneous retraction from dielectric surfaces under applied electrostatic potential.

Content Provider	Semantic Scholar
Author	Lyuksyutov, Sergei F. Paramonov, Pavel B. Mayevska, Olga Reagan, Michael A. Sancaktar, Erol Vaia, Rich A. Juhl, Soren
Copyright Year	2006
Abstract	A time-resolved method for tip' retraction at micros-scale away from dielectric surfaces has been developed. Analysis of the forces in the system comprising AFM tip, water meniscus, and polymer film suggests that an electrostatic repulsion of the tip from the surface in the double-layered (water and polymer) system, and water condensation in the tip-surface junction are the dominant factors enabling the mechanical work for tip retraction. Nanostructures of 5-80 nm height are formed in polymeric surfaces as a result. This interesting physical phenomenon could be used for nanostructures patterning in polymeric materials at enhanced aspect ratio.
File Format	PDF HTM / HTML
DOI	10.1016/j.ultramic.2006.04.002
PubMed reference number	16781078
Journal	Medline
Volume Number	106
Issue Number	10
Alternate Webpage(s)	http://digitalcommons.unl.edu/cgi/viewcontent.cgi?article=1024&context=usafresearch
Alternate Webpage(s)	http://nebula.physics.uakron.edu/dept/faculty/sfl/ULTRAM.pdf
Alternate Webpage(s)	http://digitalcommons.unl.edu/cgi/viewcontent.cgi?amp%3Bcontext=usafresearch&article=1024
Alternate Webpage(s)	https://doi.org/10.1016/j.ultramic.2006.04.002
Journal	Ultramicroscopy
Language	English
Access Restriction	Open
Content Type	Text
Resource Type	Article