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Chemical Vapor Deposition of CuOx Films by Cul and O2: Role of Cluster Formation on Film Morphology
| Content Provider | Scilit |
|---|---|
| Author | Hong, Lu-Sheng Komiyama, Hiroshi |
| Copyright Year | 1991 |
| Description | Journal: Journal of the American Ceramic Society |
| Ending Page | 1604 |
| Starting Page | 1597 |
| ISSN | 2573508X |
| e-ISSN | 15512916 |
| DOI | 10.1111/j.1151-2916.1991.tb07145.x |
| Journal | Journal of the American Ceramic Society |
| Issue Number | 7 |
| Volume Number | 74 |
| Language | English |
| Publisher | Wiley-Blackwell |
| Publisher Date | 1991-07-01 |
| Access Restriction | Open |
| Subject Keyword | Journal: Journal of the American Ceramic Society Cultural Studies Copper Oxide Chemical Vapor Deposition |
| Content Type | Text |
| Resource Type | Article |
| Subject | Ceramics and Composites Materials Chemistry |