NDLI: Boron Diffusion in TaSi2 Thin Films

Content Provider	Scilit
Author	Marmelstein, R. Sinder, M. Pelleg, J.
Copyright Year	1998
Description	Journal: Physica Status Solidi (a)
Related Links	http://onlinelibrary.wiley.com/doi/10.1002/(SICI)1521-396X(199807)168:1<223::AID-PSSA223>3.0.CO;2-4/pdf
Ending Page	229
Page Count	7
Starting Page	223
ISSN	00318965
e-ISSN	1521396X
DOI	10.1002/%28sici%291521-396x%28199807%29168%3A1%3C223%3A%3Aaid-pssa223%3E3.3.co%3B2-w
Journal	Physica Status Solidi (a)
Issue Number	1
Volume Number	168
Language	English
Publisher	Wiley-Blackwell
Publisher Date	1998-07-01
Access Restriction	Open
Subject Keyword	Journal: Physica Status Solidi (a) Nuclear Energy and Engineering Boron Diffusion Mass Spectrometry Silicon Wafer Tasi2 Thin Thin Films
Content Type	Text
Resource Type	Article
Subject	Condensed Matter Physics Electronic, Optical and Magnetic Materials

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Boron Diffusion in TaSi2 Thin Films