NDLI: Silylated poly(4‐hydroxystyrene)s as negative electron beam resists

Content Provider	Scilit
Author	Shinoda, Tsutomu Yoshikawa, Mitsuhide Nishiwaki, Tohru Inoue, Haruo
Copyright Year	1998
Description	Journal: Journal of Applied Polymer Science
Related Links	https://onlinelibrary.wiley.com/doi/pdf/10.1002/(SICI)1097-4628(19981107)70:6<1151::AID-APP12>3.0.CO;2-2
Ending Page	1157
Page Count	7
Starting Page	1151
ISSN	00218995
e-ISSN	10974628
DOI	10.1002/%28sici%291097-4628%2819981107%2970%3A6%3C1151%3A%3Aaid-app12%3E3.3.co%3B2-c
Journal	Journal of Applied Polymer Science
Issue Number	6
Volume Number	70
Language	English
Publisher	Wiley-Blackwell
Publisher Date	1998-11-07
Access Restriction	Open
Subject Keyword	Journal: Journal of Applied Polymer Science Atmospheric Sciences Silylated Poly(4-hydroxystyrene)s Poly(4-tert-butyldimethylsilyloxystyrene) Radical Polymerization Gel Permeation Chromatography Electron Beam Resists
Content Type	Text
Resource Type	Article
Subject	Chemistry Surfaces, Coatings and Films Materials Chemistry Polymers and Plastics

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Silylated poly(4‐hydroxystyrene)s as negative electron beam resists