NDLI: Comparative mass spectrometric analyses of Photofrin oligomers by fast atom bombardment mass spectrometry, UV and IR matrix-assisted laser desorption/ionization mass spectrometry, electrospray ionization mass spectrometry and laser desorption/jet-cooling photoionization mass spectrometry

Content Provider	Scilit
Author	Siegel, Marshall M. Tabei, Keiko Tsao, Rushung Pastel, Michael J. Pandey, Ravindra K. Berkenkamp, Stefan Hillenkamp, Franz de Vries, Mattanjah S.
Copyright Year	1999
Description	Journal: Journal of Mass Spectrometry
Ending Page	669
Starting Page	661
ISSN	2573508X
e-ISSN	10969888
DOI	10.1002/%28sici%291096-9888%28199906%2934%3A6%3C661%3A%3Aaid-jms818%3E3.3.co%3B2-9
Journal	Journal of Mass Spectrometry
Issue Number	6
Volume Number	34
Language	English
Publisher	Wiley-Blackwell
Publisher Date	1999-06-01
Access Restriction	Open
Subject Keyword	Journal: Journal of Mass Spectrometry Analytical Chemistry Photodynamic Therapy Oligomer Distribution Mass Spectrometry Fast Atom Bombardment Matrix-assisted Laser Desorption/ionization Electrospray Ionization Laser Desorption/jet Cooling Photoionization
Content Type	Text
Resource Type	Article
Subject	Spectroscopy Medicine

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Comparative mass spectrometric analyses of Photofrin oligomers by fast atom bombardment mass spectrometry, UV and IR matrix-assisted laser desorption/ionization mass spectrometry, electrospray ionization mass spectrometry and laser desorption/jet-cooling photoionization mass spectrometry