NDLI: Nanoscale reinforcement of polyhedral oligomeric silsesquioxane (POSS) in polyurethane elastomer

Content Provider	Scilit
Author	Fu, Bruce X. Hsiao, Benjamin S. White, Henry Rafailovich, Miriam Mather, Patrick T. Jeon, Hong G. Phillips, Shawn Lichtenhan, Joseph Schwab, Joseph
Copyright Year	2000
Description	Journal: Polymer International
Related Links	https://onlinelibrary.wiley.com/doi/pdf/10.1002/(SICI)1097-0126(200005)49:5<437::AID-PI239>3.0.CO;2-1
Ending Page	440
Page Count	4
Starting Page	437
ISSN	09598103
e-ISSN	10970126
DOI	10.1002/%28sici%291097-0126%28200005%2949%3A5%3C437%3A%3Aaid-pi239%3E3.0.co%3B2-1
Journal	Polymer International
Issue Number	5
Volume Number	49
Language	English
Publisher	Wiley-Blackwell
Publisher Date	2000-05-01
Access Restriction	Open
Subject Keyword	Journal: Polymer International Polyhedral Oligomeric Silsesquioxane Microphase Separation
Content Type	Text
Resource Type	Article
Subject	Organic Chemistry Materials Chemistry Polymers and Plastics

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Nanoscale reinforcement of polyhedral oligomeric silsesquioxane (POSS) in polyurethane elastomer